Data

High resolution optical images

The University of Queensland
Dr Hongtao Xie (Aggregated by) Dr Lizhen Hou (Aggregated by) Dr Shiliang Wang (Aggregated by) Professor Han Huang (Aggregated by) Professor Han Huang (Aggregated by)
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ctx_ver=Z39.88-2004&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Adc&rfr_id=info%3Asid%2FANDS&rft_id=info:doi10.14264/uql.2016.1151&rft.title=High resolution optical images&rft.identifier=10.14264/uql.2016.1151&rft.publisher=The University of Queensland&rft.description=Fig.1 (a) The optical image of a NW, sliding on the Si substrate at a constant speed due to the push from a W tip. (b) Mechanical loading model for the sliding NW. Fig.2 The optical images of a NW (a) rest on the Si substrate, (b) being pushed horizontally and bent, (c) being pushed and pressed, and (d) being pulled and pressed by the W tip 1; (e) being pushed and pressed and (f) being pulled and pressed by the W tip 2. The insets in (b)–(e) show the contact configuration between the W tip and the NW, where the arrows describe the direction of the force, F, acted on the NW from the W tip. Fig.3 The bent NW slid on the (a) Si substrate pushed by tip 1, (b) Si substrate pushed by tip 2, and (c) SiN substrate by tip 2. (d) Frictional shear stresses on Si and SiN substrates plotted as a function of the NW length. (e) Roughness of the Si and SiN substrates measured by AFM.&rft.creator=Dr Hongtao Xie&rft.creator=Dr Lizhen Hou&rft.creator=Dr Shiliang Wang&rft.creator=Professor Han Huang&rft.creator=Professor Han Huang&rft.date=2015&rft.coverage=153.369141,-28.304381&rft_rights=2015, The University of Queensland&rft_rights= https://guides.library.uq.edu.au/deposit-your-data/license-reuse-data-agreement&rft_subject=eng&rft_subject=Kinetics&rft_subject=Micromanipulators&rft_subject=Nanotechnology&rft_subject=Nanowire&rft_subject=Shear stress&rft_subject=NANOTECHNOLOGY&rft_subject=TECHNOLOGY&rft_subject=Nanomaterials&rft_subject=Nanotechnology not elsewhere classified&rft.type=dataset&rft.language=English Access the data
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Fig.1 (a) The optical image of a NW, sliding on the Si substrate at a constant speed due to the push from a W tip. (b) Mechanical loading model for the sliding NW. Fig.2 The optical images of a NW (a) rest on the Si substrate, (b) being pushed horizontally and bent, (c) being pushed and pressed, and (d) being pulled and pressed by the W tip 1; (e) being pushed and pressed and (f) being pulled and pressed by the W tip 2. The insets in (b)–(e) show the contact configuration between the W tip and the NW, where the arrows describe the direction of the force, F, acted on the NW from the W tip. Fig.3 The bent NW slid on the (a) Si substrate pushed by tip 1, (b) Si substrate pushed by tip 2, and (c) SiN substrate by tip 2. (d) Frictional shear stresses on Si and SiN substrates plotted as a function of the NW length. (e) Roughness of the Si and SiN substrates measured by AFM.

Issued: 2015

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153.36914,-28.30438

153.369141,-28.304381

Subjects
Kinetics | Micromanipulators | Nanotechnology | Nanomaterials | Nanotechnology | Nanotechnology Not Elsewhere Classified | Nanowire | Shear stress | Technology | eng |

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ACN 633 798 857