FEI Helios Nanolab G3 CX DualBeam FIB-SEM

Full description

The FEI Helios DualBeam is the third generation of FEI's Helios Nanolab Ultra High Resolution Scanning Electron Microscope (SEM) equipped with Focused Ion Beam (FIB) technology, offering sub-nanometre resolution electron beam imaging over a large operating voltage range, 3D (volumetric) imaging, site-specific sample preparation and nano-fabrication capabilities.

The instrument is equipped with an array of in-lens, in-column, and chamber detectors, bright field, dark field and high angle annular dark field STEM detectors, and an 80mm2 Oxford Instruments X-Max SDD EDX detector for microanalysis. Using FEI's MAPS imaging software, automatic acquisition of large images and correlative workflows, for example combining optical microscopy and SEM, are made possible.

This facility was funded through the Australian Research Council (LIEF grant LE150100006), with support from UWA, Curtin, Murdoch, ECU, Sydney University and CSIRO.

Techniques

• Secondary electron (SE) imaging
• Backscattered electron (BSE) imaging
• Scanning transmission electron microscopy (STEM), including bright field (BF), dark field (DF) and high angle annular dark field (HAADF) modes
• Energy-dispersive X-ray spectroscopy (EDX) – point mode and mapping (using the AZtec software) — 3D (using the INCA software)
• Automatic acquisition of large images (using the MAPS software)
• Correlative microscopy (using the MAPS software)
• 3D (volumetric) imaging (using the automated Slice-and-View software)
• Site-specific sample preparation for TEM, SIMS, atom probe and other analytical techniques
• Nano-machining and nano-fabrication (using the Nanobuilder software)