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Data from: Highly stable bonding of thiol monolayers to hydrogen-terminated si via supercritical carbon dioxide: toward a super hydrophobic and bioresistant surface

RMIT University, Australia
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ctx_ver=Z39.88-2004&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Adc&rfr_id=info%3Asid%2FANDS&rft_id=https://figshare.com/articles/Highly_Stable_Bonding_of_Thiol_Monolayers_to_Hydrogen-Terminated_Si_via_Supercritical_Carbon_Dioxide_Toward_a_Super_Hydrophobic_and_Bioresistant_Surface/3808188&rft.title=Data from: Highly stable bonding of thiol monolayers to hydrogen-terminated si via supercritical carbon dioxide: toward a super hydrophobic and bioresistant surface&rft.identifier=9cec4dafe4709abb4f063de527871235&rft.publisher=RMIT University, Australia&rft.description=Attached file provides supplementary data for linked article. Oxide-free silicon Chemistry has been widely studied using wet-chemistry methods,-but for emerging applications such as molecular electronics on silicon, nano-wire -based sensors, and biochips, these methods may not be suitable as they can give rise to defects due to surface contamination, residual solvents, which in turn can affect the grafted monolayer devices for practical.applications. Therefore, there is a need for a cleaner, reproducible, scalable, and environmentally benign monolayer grafting process. In this work; monolayers of alkylthiols were deposited on oxide-free semi conductor surfaces using supercritical carbon dioxide (SCCO2) as a carrier fluid owing to its favorable physical properties. The identity of grafted monolayers. was monitored with Fourier transform infrared (FTIR) spectroscopy, high-resolution X-ray photoelectron spectroscopy (HRXPS), XPS, atomic force microscopy (AFM), contact angle measurements, and ellipsometry. Monolayers on oxide-free silicon were able to passivate the surface for more than 50 days (10 times than the conventional methods) without any oxide formation in ambient atmosphere. Application of the SCCO2 process was further extended by depositing-alkylthiol monolayers on fragile and brittle 1D silicon nanowires (Sil\TWS) and 2D germanium substrates. With the recent interest in SiNWs for biological applications, the thiol-passivated.oxide-free silicon nanowire surfaces were also studied for their biological response. Alkylthiol-functionalized Sil\f Ars showed-a significant decrease in Cell proliferation owing to their superhydrophobicity combined with the rough surface morphology. Furthermore, tribological studies showed a sharp decrease in the coefficient of friction, which was found to be dependent on the alkyl chain length and surface bond. These studies can be used for the development of cost-effective and highly stable monolayers for practical applications such as solar cells, biosensors, molecular electronics, micro- and nano- electromechanical systems, antifouling agents, and drug delivery.&rft.creator=Anonymous&rft.date=2018&rft.relation=http://dx.doi.org/10.1021/acsami.6b06018&rft_rights=All rights reserved &rft_rights=CC BY-NC: Attribution-Noncommercial 3.0 AU http://creativecommons.org/licenses/by-nc/3.0/au&rft_subject=Alkylthiol&rft_subject=Bio-resistant&rft_subject=Cell proliferation&rft_subject=Hydrogen-terminated silicon&rft_subject=Monolayer&rft_subject=Supercritical carbon dioxide (SCCO2) &rft_subject=Superhydrophobic surface&rft_subject=Macromolecular and Materials Chemistry not elsewhere classified&rft_subject=CHEMICAL SCIENCES&rft_subject=MACROMOLECULAR AND MATERIALS CHEMISTRY&rft.type=dataset&rft.language=English Access the data

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Attached file provides supplementary data for linked article. Oxide-free silicon Chemistry has been widely studied using wet-chemistry methods,-but for emerging applications such as molecular electronics on silicon, nano-wire -based sensors, and biochips, these methods may not be suitable as they can give rise to defects due to surface contamination, residual solvents, which in turn can affect the grafted monolayer devices for practical.applications. Therefore, there is a need for a cleaner, reproducible, scalable, and environmentally benign monolayer grafting process. In this work; monolayers of alkylthiols were deposited on oxide-free semi conductor surfaces using supercritical carbon dioxide (SCCO2) as a carrier fluid owing to its favorable physical properties. The identity of grafted monolayers. was monitored with Fourier transform infrared (FTIR) spectroscopy, high-resolution X-ray photoelectron spectroscopy (HRXPS), XPS, atomic force microscopy (AFM), contact angle measurements, and ellipsometry. Monolayers on oxide-free silicon were able to passivate the surface for more than 50 days (10 times than the conventional methods) without any oxide formation in ambient atmosphere. Application of the SCCO2 process was further extended by depositing-alkylthiol monolayers on fragile and brittle 1D silicon nanowires (Sil\TWS) and 2D germanium substrates. With the recent interest in SiNWs for biological applications, the thiol-passivated.oxide-free" silicon nanowire surfaces were also studied for their biological response. Alkylthiol-functionalized Sil\f Ars showed-a significant decrease in Cell proliferation owing to their superhydrophobicity combined with the rough surface morphology. Furthermore, tribological studies showed a sharp decrease in the coefficient of friction, which was found to be dependent on the alkyl chain length and surface bond. These studies can be used for the development of cost-effective and highly stable monolayers for practical applications such as solar cells, biosensors, molecular electronics, micro- and nano- electromechanical systems, antifouling agents, and drug delivery.

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  • Local : 9cec4dafe4709abb4f063de527871235
ACN 633 798 857