Research Grant
[Cite as https://purl.org/au-research/grants/arc/DE140100805]Researchers: The Australian National University (Managed by) , Yuerui Lu (Discovery Early Career Researcher Award)
Brief description Radioisotope-powered Parallel Electron Lithography for High-throughput Nano-manufacturing. This project aims to realise rapid fabrication of controllable nano-devices over large areas with high throughput and low cost. The lack of large-size (greater than four inch) mask and ultra-low dose resist are the fundamental challenges for high-throughput radioisotope-powered parallel electron nano-lithography (RIPEL) systems. This project aims to realise a large-size RIPEL mask by using the ultra-light supporting material aerographite that has a state-of-the-art ratio value of Young's modulus to cubic density. It will also develop a new inorganic nanoparticle resist with ultra-low dose. These building blocks will enhance RIPEL's throughput by four orders of magnitude. The project will contribute to making processors or solid state storage cheaper and more efficient.
Funding Amount $395,220
Funding Scheme Discovery Early Career Researcher Award
- PURL : https://purl.org/au-research/grants/arc/DE140100805
- ARC : DE140100805